Author Correction: Wafer-scale high-κ HfO2 dielectric films with sub-5-Å equivalent oxide thickness for 2D MoS2 transistors
- Songge Zhang
- Tao Zhang
- Hua Yu
- Tong Li
- Xiuzhen Li
- Chenyang Cui
- Yuchao Zhou
- Hailing Guo
- Shuopei Wang
- Dongfeng Zheng
- Liangfeng Huang
- Liqi Bai
- Su Liu
- Cheng Shen
- Wei Yang
- Luojun Du
- Dongxia Shi
- Lede Xian
- Xiaoming Tao
- Yang Chai
- Na Li
- Guangyu Zhang
2026-04-13