Gate-driven band modulation hyperdoping for high-performance p-type 2D semiconductor transistors
- Bei Zhao
- Zucheng Zhang
- Junqing Xu
- Dingli Guo
- Tiancheng Gu
- Guiming He
- Ping Lu
- Kun He
- Jia Li
- Zhao Chen
- Quan Ren
- Lin Miao
- Junpeng Lu
- Zhenhua Ni
- Xiangfeng Duan
- Xidong Duan
2025-06-18
Tailoring carrier density in atomically thin two-dimensional (2D) semiconductors is challenging because of the inherently limited physical space for incorporating charge dopants. Here, we report that interlayer charge-transfer doping in type III van der Waals heterostructures can be greatly modulated by an external gate to realize a hyperdoping effect. Systematic gated-Hall measurements revealed that the modulated carrier density is about five times that of the gate capacitive charge, achieving an ultrahigh 2D hole density of 1.49 × 10 14 per square centimeter, far exceeding the maximum possible electrostatic doping limit imposed by typical dielectric breakdown. The highly efficient hole-doping enables high-performance p-type 2D transistors with an ultralow contact resistance of ~0.041 kilohm micrometers and a record-high ON-state current density of ~2.30 milliamperes per micrometer.